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jsonstein@masto.deoan.org ("Jeff Sonstein") wrote:
“Intel will be using the new machine to experiment with High-NA EUV before it deploys commercial grade Twinscan EXE:5200 tool for high-volume manufacturing (HVM) sometime in 2025. The announcement represents a major industry milestone that will have an impact not only on Intel, but eventually on the other leading-edge fabs as well.”
https://www.anandtech.com/show/21194/asml-ships-first-high-na-euv-scanner-to-intel